TY  - JOUR
A1  - Lee, D 
A1  - Ting, Y 
A1  - Oksuz, L 
A1  - Hershkowitz, N 
T1  - Measurement of plasma potential fluctuations by emissive probes in CF4 radio-frequency plasma.
Y1  - 2006/11/
N1  - R831459
JF  - PLASMA SOURCES SCIENCE TECHNOLOGY
VL  - 15
IS  - 4
SP  - 873–878
ER  - 


TY  - JOUR
A1  - Machima, P 
A1  - Hershkowitz, N 
T1  - SiO2 and Si3N4 etch mechanisms in NF3/hydrocarbon plasma.
Y1  - 2006/02/21
N1  - R831459
JF  - JOURNAL OF PHYSICS D
VL  - 39
IS  - 4
SP  - 673
EP  - 684
ER  -